Reflectometer (SR)

Ellipsometer (SE)

Spectroscopic ellipsometry (SE) is a powerful technique to precisely measure thin film thickness， determine optical constants， investigate surface and interface phenomenon and many other physical， chemical and optical properties of materials. Angstrom Sun Technologies Inc designs and manufactures high quality spectroscopic ellipsometer systems with various options for different applications. Besides ellipsometer system itself， the advanced analysis software is essential to extract the desired information as above-mentioned， such as thickness， roughness， alloy concentration and dielectric constants. TFProbe™ 3.0from us offers powerful analysis functions for ellipsometry sensitivity study， photometry / ellipsometry simulation and data regression. Unique but configurable mode allows different users to access different level and suitable for both R&D and production quality control purpose.

Models are specified based on wavelength ranges for different applications. The following graph shows available models for standard configurations. In addition， Model 500 simply covers a range of both Model 100 and 400. Customized products are available with wavelength range extension further down to DUV or Infrared (IR) ranges. Normally:

Model 100 covers a wavelength range from DUV to NIR range up to 1100nm.

Model 200 covers DUV and Visible range.

Model 300 covers Visible range， starting from 370nm to 850nm

Model 400 covers NIR range starting from 900nm typically

Model 450 covers Vis to NIR range， starting from 370nm up to 1700nm typically

Model 500 covers DUV to NIR range， up to 2500nm

Model 600 covers NIR to IR range (1.7um to 17um or 1.7um to 30um)

Wavelength range coverage depends on several factors such as light source， detectors， optics used in system， light delivery method (using fibers or not). Because of these factors， all tools can be customized based on specific application. For example， NIR range can be covered up to 1700nm or 2200nm or 2500nm etc. DUV range can be down to 190 nm.

Model SE300BM， 400-1100nm， no mapping，

Model SE200BM， 250-1100nm， no mapping

Model SE450BM， 400-1700nm， no mapping

Model SE500BM， 190-1700nm， no mapping

6" stage mapping， adds $20K.

8" stage mapping， adds $22K.

設(shè)備型號(hào)說明:

Example Model: SE200BA-M300

SE: Spectroscopic Ellipsometer

200: Indicates

B: Detecting Type

A: Scanning monochromator with single element detector

B: Array Type detector with spectrograph or interferometer

A: Variable Incident Angle Type

A: Automatic variable angle with precision Goniometer and computer controlled

M: Manually adjustable incident angle at 5 degree interval

M: Mapping Stage

300: Maximum mapping sample size

• Wavelength Extension to VUV or IR Range

• Stage Size

• Probing beam Spot size

• Photometry

• Heating/Cooling Stage

• Mapping stage in X-Y or Rho-Theta

· Semiconductor fabrication (PR， Oxide， Nitride..)

· Liquid crystal display (ITO， PR， Cell gap…..)

· Biological films and materials

· Optical coatings， TiO₂， SiO₂， Ta₂O₅…..

· Semiconductor compounds

· Functional films in MEMS/MOEMS

· Amorphous， nano and crystalline Si

· Solar Cell Industry

· Medical device fabrication

There are many techniques for characterizing materials， each having its own advantages and disadvantages and each being uniquely able to reveal material properties that other techniques can't access. Spectroscopic ellipsometry (SE) is an optical technique that is particularly flexible in that it can be used to determine the optical and physical properties of a wide variety of thin-film materials. Its ability to do this without contact or damage to the material of interest has seen it become routinely used in R&D laboratories and within manufacturing facilities for monitoring thin film growth and deposition processes.

SE relies on the determination of the polarization state of a beam of polarized light reflected from the sample under characterization. When performing SE measurements， the polarization state is determined at many discrete wavelengths over a broad wavelength range. The change in the polarization state can be traced to the physical properties of the thin film by means of a model. Characteristics such as layer thickness， surface roughness， refractive index (n) and extinction coefficient (k) of the materials can be determined with excellent precision through regression analysis.

The instrument determines two ellipsometry angles Ψ and Δ， which describe the change in the polarization state of the beam upon reflection from the sample. The ratio of the amplitude of the polarization within the plane of incidence (P) to the amplitude of the polarization perpendicular to the plane of incidence (S) is represented by Ψ. The phase retardation between the two polarization vectors P and S is represented by Δ. Changes in Δ and Ψ essentially depend upon the optical constants， n and k， of the layer materials and substrate， physical thickness of the individual layers and surface roughness. A regression analysis allows the determination of these parameters.

SE data for Δ and Ψ are obtained at a number of incident angles in a plane normal to the sample surface and typically at 100-200 different wavelengths for each angle. SE instruments use a white light source and individual wavelengths are selected for detection by either a motor driven monochromator， or a multi-channel detector that can detect many wavelengths simultaneously. Increasing the number of angles and wavelengths at which data are acquired improves analysis precision， especially for complicated epitaxial structures.

1. System configuration and Specifications subject to change without notice

2. * Film property， surface quality and layer stack dependent

3. Customized system available for special applications

4. TFProbe is registered trademark of Angstrom Sun Technologies Inc.

• Features

• System Configurations

• Specifications

• Options

• Applications

• Application Examples

· Advanced DUV optics and rugged design for highest uptime and the best system performance

· Array based detector system to ensure fast measurement

· Affordable， portable and small footprint table top design

· Measure film thickness and Refractive Index up to 5 layers over micron size region

· Allow to acquire reflection， transmission and absorption spectra in milliseconds

· Capable to be used for real time spectra， thickness， refractive index monitoring

· System comes with comprehensive optical constants database and library

· Advanced Software allows user to use either NK table， dispersion or composite model (EMA) for each individual film

· Integrated Vision， spectrum， simulation， film thickness measurement system

· Apply to many different type of substrates with different thickness up to 200mm size

· Deep ultraviolet light allows to measure film thickness down to 20Å

· 2D and 3D output graphics and user friendly data management interface

· Advanced Imaging software for dimension measurement such as angle， distance， area， particle counting and more

· Various options available to meet special applications

· Detector: CCD Array with 2048 pixels

· Light Source: High power DUV-Visible

· Automatic Stage: Black Anodized Aluminum Alloy with 5”x3” net travel distance and 1µm resolution， program controlled

· Motorized Z focus drive and X-Y-Z joystick

· Long Working Distance Objectives: 4x， 10x， 15x(DUV)， 50x

· Communication: USB

· Measurement Type: Reflection/Transmission spectra， Film thickness/refractive index and feature dimensions

· Computer: Intel Core 2 Duo Processor with 200GB Hard drive and DVD+RW Burner plus 19” LCD Monitor

· Power: 110– 240 VAC /50-60Hz， 3 A

· Dimension: 16’x16’x18’ (Table top setup)

· Weight: 120 lbs total

· Warranty: One year labor and parts

· Wavelength Resolution: 1nm

· Spot Size: 100µm (4x)， 40µm (10x)， 30µm (15x)， 8µm (50x)

· Substrate Size: up to 20mm thick

· Measurable thickness range^*: 20Å to 25 µm

· Measurement Time: 2 ms minimum

· Accuracy^*: better than 0.5% (comparing with ellipsometry results for Thermal Oxide sample by using the same optical constants)

· Repeatability^*: < 2 Ǻ (1 sigma from 50 thickness readings for 1500 Ǻ Thermal SiO2 on Si Wafer)

· Higher power DUV optics for smaller spot size

· Customized configuration for special applications

· Heating and Cooling Stage for dynamic study

· Optional stage size holding samples up to 300mm

· Higher wavelength range resolution down to 0.1nm

· Various filters for special applications

· Add-on accessories for fluorescence measurement

· Add-on accessories for Raman applications

· Add-on accessories for polarizing applications

· Liquid crystal display (ITO， PR， Cell gap…..)

· Forensics， Biological films and materials

· Inks， Mineralogy， Pigments， Toners

· Pharmaceuticals， Medial Devices

· Optical coatings， TiO₂， SiO₂， Ta₂O₅…..

· Semiconductor compounds

· Functional films in MEMS/MOEMS

· Amorphous， nano and crystalline Si

2. Measured Film Thickness

3. Measured Reflection Spectrum over a MEMS Mirror

4. Mapped Thickness Uniformity over 4" wafer

2. * Film property， surface quality and layer stack dependent

3. Customized system available for special applications

4. TFProbe is registered trademark of Angstrom Sun Technologies Inc.

• Features

• System Configurations

• Specifications

• Options

• Applications

• Application Examples

• More Information

Film Thickness Measurement - SRM300 Film Thickness Gauge

· Easy to set up and operate with Window based software

· Various types of geometry substrate up to 300mm in diameter

· Various types of mapping pattern such as linear， polar， square or arbitrary coordinates

· Advanced optics and rugged design for best system performance

· Array based detector system to ensure fast measurement

· Map film thickness and Refractive Index up to 5 layers

· System comes with comprehensive optical constants database and library

· Include commonly used recipes

· Advanced TFProbe Software allows user to use either NK table， dispersion or effective media approximation (EMA) for each individual film.

· Upgradeable to MSP (Microspectrophotometer) mapping system with pattern recognition， or Large Spot for mapping over patterned or featured structure (with Zonerage Model)

· Apply to many different type of substrates with different thickness

· 2D and 3D output graphics and user friendly data management interface with statistical results

· Detector: CCD Array with 2048 pixels

· Light Source: DC regulated Tungsten-Halogen

· Light Delivery: Optics

· Stage¹: Black Anodized Aluminum Alloy Vacuum chuck holds 200 mm wafer

· Communication: USB & RS232

· Software: TFProbe 2.2M

· Measurement Type: Film thickness， reflection spectrum， refractive index

· Computer: Intel Core 2 Duo Processor with 200GB Hard drive and DVD+RW Burner plus 19” LCD Monitor

· Power: 110– 240 VAC /50-60Hz， 3 A

· Dimension: 14”(W) x 20”(D) x 14”(H)

· Weight: 100 lbs

· Warranty: One year labor and parts

• Wavelength range: 400 to 1050 nm

• Spot Size: 500 µm to 5mm

• Sample Size: 300 mm in diameter

• Substrate Size: up to 50mm thick

• Number of Layers^*: Up to 5 films

• Measurable thickness range^*: 50 nm to 50 µm

• Measurement Time: 2ms - 1s /site typical

• Positional Repeatability: ~1 µm

• Accuracy^*: better than 0.5% (comparing with ellipsometry results for Thermal Oxide sample by using the same optical constants)

• Repeatability^*: < 2Ǻ (1 sigma from 50 thickness readings at center for 1500 Ǻ Thermal SiO2 on Si Wafer)

• Additional Models with Wavelength Extension to DUV or NIR Range: SRM100: 250nm - 1000nm

• SRM400: 900nm - 1700nm

• SRM500: 400nm - 1700nm

• Other Sample Size: 200mm wafer (SRM300-200)

• Customized size: Available

• Large Spot Accessories for featured structure measurement

• Small spot accessories for highly non uniform samples

· Liquid crystal display (ITO， PR， Cell gap…..)

· Biological films and materials

· Optical coatings， TiO₂， SiO₂， Ta₂O₅…..

· Semiconductor compounds

· Functional films in MEMS/MOEMS

· Amorphous， nano and crystalline Si

2. 2D contour plot for Nitride layer in a three layer stack (Nitride-Oxide-Nitride on Glass)

2. * Film property， surface quality and layer stack dependent

3. Customized system available for special applications

4. TFProbe is registered trademark of Angstrom Sun Technologies Inc.